Metal sputtering targets are critical components of the sputtering process used in the manufacturing of thin films for semiconductor and other advanced applications. These targets are high-purity metals or alloys with specific chemical compositions, and they are subjected to physical bombardment by ionized gas to generate thin films using a process called sputtering. The material sputtered from the target is accurately deposited onto the substrate to produce thin films required for various industrial applications, including electronics, optics, and magnetic storage, among others. Metal sputtering targets play an essential role in the production of high-performance electronic devices and other advanced technological applications.
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